Abstract
The present invention relates to a process for preparing a functionalized Si/Ge- surface, wherein an unfunctionalised Si/Ge-surface is contacted in the presence of ultraviolet radiation with a C2-C50 alkene and/or a C2-C50 alkyne, the alkene and/or alkyne being optionally substituted and/or being optionally interrupted by one or more heteroatoms. The present invention further relates to articles or substrates comprising the functionalized Si/Ge-surface and the use of the functionalised Si/Ge-surface to prevent or to reduce adsorption of a biomolecule to an article or a substrate.
Original language | English |
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Patent number | WO2009017411 |
Priority date | 1/08/07 |
Publication status | Published - 5 Feb 2009 |