The present invention relates to a process for preparing a functionalized Si/Ge- surface, wherein an unfunctionalised Si/Ge-surface is contacted in the presence of ultraviolet radiation with a C2-C50 alkene and/or a C2-C50 alkyne, the alkene and/or alkyne being optionally substituted and/or being optionally interrupted by one or more heteroatoms. The present invention further relates to articles or substrates comprising the functionalized Si/Ge-surface and the use of the functionalised Si/Ge-surface to prevent or to reduce adsorption of a biomolecule to an article or a substrate.
title = "Protein repelling Silicon and Germanium surfaces",
abstract = "The present invention relates to a process for preparing a functionalized Si/Ge- surface, wherein an unfunctionalised Si/Ge-surface is contacted in the presence of ultraviolet radiation with a C2-C50 alkene and/or a C2-C50 alkyne, the alkene and/or alkyne being optionally substituted and/or being optionally interrupted by one or more heteroatoms. The present invention further relates to articles or substrates comprising the functionalized Si/Ge-surface and the use of the functionalised Si/Ge-surface to prevent or to reduce adsorption of a biomolecule to an article or a substrate.",
author = "C.G.P.H. Schroen and M. Rosso and H. Zuilhof",
T1 - Protein repelling Silicon and Germanium surfaces
AU - Schroen, C.G.P.H.
AU - Rosso, M.
AU - Zuilhof, H.
N1 - WoS
PY - 2009/2/5
Y1 - 2009/2/5
N2 - The present invention relates to a process for preparing a functionalized Si/Ge- surface, wherein an unfunctionalised Si/Ge-surface is contacted in the presence of ultraviolet radiation with a C2-C50 alkene and/or a C2-C50 alkyne, the alkene and/or alkyne being optionally substituted and/or being optionally interrupted by one or more heteroatoms. The present invention further relates to articles or substrates comprising the functionalized Si/Ge-surface and the use of the functionalised Si/Ge-surface to prevent or to reduce adsorption of a biomolecule to an article or a substrate.
AB - The present invention relates to a process for preparing a functionalized Si/Ge- surface, wherein an unfunctionalised Si/Ge-surface is contacted in the presence of ultraviolet radiation with a C2-C50 alkene and/or a C2-C50 alkyne, the alkene and/or alkyne being optionally substituted and/or being optionally interrupted by one or more heteroatoms. The present invention further relates to articles or substrates comprising the functionalized Si/Ge-surface and the use of the functionalised Si/Ge-surface to prevent or to reduce adsorption of a biomolecule to an article or a substrate.