Photochemical attachment of organic monolayers onto H-terminated Si(111): Radical chain propagation observed via STM studies

B.J. Eves, Q.Y. Sun, G.P. Lopinski, H. Zuilhof

Research output: Contribution to journalArticleAcademicpeer-review

114 Citations (Scopus)

Abstract

Photochemical reactions of terminal alkenes with hydrogen-terminated silicon surfaces are being used by many groups to produce covalently attached organic monolayers with a wide range of terminal functionalities. Despite the considerable activity in this area, the mechanism for these reactions has not been definitively established. Here we present STM and HREELS data on a sequence of partially reacted samples, showing the progress of the reaction. The attachment reaction is found to proceed via formation of irregularly shaped islands that appear to grow by a pseudorandom walk process. These data support a radical chain propagation mechanism previously suggested for this reaction. However, since the photons employed here (447 nm) lack sufficient energy for Si-H bond cleavage, an alternate mechanism for initiating the chain reaction appears to be required.
Original languageEnglish
Pages (from-to)14318-14319
JournalJournal of the American Chemical Society
Volume126
Issue number44
DOIs
Publication statusPublished - 2004

Keywords

  • silicon surfaces
  • alkyl monolayers
  • visible-light
  • dna
  • si

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