Photochemical attachment of organic monolayers onto H-terminated Si(111): Radical chain propagation observed via STM studies

B.J. Eves, Q.Y. Sun, G.P. Lopinski, H. Zuilhof

Research output: Contribution to journalArticleAcademicpeer-review

114 Citations (Scopus)

Abstract

Photochemical reactions of terminal alkenes with hydrogen-terminated silicon surfaces are being used by many groups to produce covalently attached organic monolayers with a wide range of terminal functionalities. Despite the considerable activity in this area, the mechanism for these reactions has not been definitively established. Here we present STM and HREELS data on a sequence of partially reacted samples, showing the progress of the reaction. The attachment reaction is found to proceed via formation of irregularly shaped islands that appear to grow by a pseudorandom walk process. These data support a radical chain propagation mechanism previously suggested for this reaction. However, since the photons employed here (447 nm) lack sufficient energy for Si-H bond cleavage, an alternate mechanism for initiating the chain reaction appears to be required.
Original languageEnglish
Pages (from-to)14318-14319
JournalJournal of the American Chemical Society
Volume126
Issue number44
DOIs
Publication statusPublished - 2004

Fingerprint

Photochemical reactions
Alkenes
Silicon
Photons
Islands
Olefins
Hydrogen
Monolayers

Keywords

  • silicon surfaces
  • alkyl monolayers
  • visible-light
  • dna
  • si

Cite this

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title = "Photochemical attachment of organic monolayers onto H-terminated Si(111): Radical chain propagation observed via STM studies",
abstract = "Photochemical reactions of terminal alkenes with hydrogen-terminated silicon surfaces are being used by many groups to produce covalently attached organic monolayers with a wide range of terminal functionalities. Despite the considerable activity in this area, the mechanism for these reactions has not been definitively established. Here we present STM and HREELS data on a sequence of partially reacted samples, showing the progress of the reaction. The attachment reaction is found to proceed via formation of irregularly shaped islands that appear to grow by a pseudorandom walk process. These data support a radical chain propagation mechanism previously suggested for this reaction. However, since the photons employed here (447 nm) lack sufficient energy for Si-H bond cleavage, an alternate mechanism for initiating the chain reaction appears to be required.",
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author = "B.J. Eves and Q.Y. Sun and G.P. Lopinski and H. Zuilhof",
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Photochemical attachment of organic monolayers onto H-terminated Si(111): Radical chain propagation observed via STM studies. / Eves, B.J.; Sun, Q.Y.; Lopinski, G.P.; Zuilhof, H.

In: Journal of the American Chemical Society, Vol. 126, No. 44, 2004, p. 14318-14319.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Photochemical attachment of organic monolayers onto H-terminated Si(111): Radical chain propagation observed via STM studies

AU - Eves, B.J.

AU - Sun, Q.Y.

AU - Lopinski, G.P.

AU - Zuilhof, H.

PY - 2004

Y1 - 2004

N2 - Photochemical reactions of terminal alkenes with hydrogen-terminated silicon surfaces are being used by many groups to produce covalently attached organic monolayers with a wide range of terminal functionalities. Despite the considerable activity in this area, the mechanism for these reactions has not been definitively established. Here we present STM and HREELS data on a sequence of partially reacted samples, showing the progress of the reaction. The attachment reaction is found to proceed via formation of irregularly shaped islands that appear to grow by a pseudorandom walk process. These data support a radical chain propagation mechanism previously suggested for this reaction. However, since the photons employed here (447 nm) lack sufficient energy for Si-H bond cleavage, an alternate mechanism for initiating the chain reaction appears to be required.

AB - Photochemical reactions of terminal alkenes with hydrogen-terminated silicon surfaces are being used by many groups to produce covalently attached organic monolayers with a wide range of terminal functionalities. Despite the considerable activity in this area, the mechanism for these reactions has not been definitively established. Here we present STM and HREELS data on a sequence of partially reacted samples, showing the progress of the reaction. The attachment reaction is found to proceed via formation of irregularly shaped islands that appear to grow by a pseudorandom walk process. These data support a radical chain propagation mechanism previously suggested for this reaction. However, since the photons employed here (447 nm) lack sufficient energy for Si-H bond cleavage, an alternate mechanism for initiating the chain reaction appears to be required.

KW - silicon surfaces

KW - alkyl monolayers

KW - visible-light

KW - dna

KW - si

U2 - 10.1021/ja045777x

DO - 10.1021/ja045777x

M3 - Article

VL - 126

SP - 14318

EP - 14319

JO - Journal of the American Chemical Society

JF - Journal of the American Chemical Society

SN - 0002-7863

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