Leaf diffusion resistance to water vapour and its direct measurement: Design, calibration and pertinent theory of an improved leaf diffusion resistance meter

C.J. Stigter; J. Birnie; B. Lammers

Leaf diffusion resistance to water vapour and its direct measurement: Design, calibration and pertinent theory of an improved leaf diffusion resistance meter

C.J. Stigter, J. Birnie, B. Lammers

Research output: Book/Report › Report › Professional

Original language	English
Place of Publication	Wageningen
Publisher	Veenman
Number of pages	55
Publication status	Published - 1973

Publication series

Name	Mededelingen / Landbouwhogeschool Wageningen
No.	73-15
ISSN (Print)	1872-728X

Keywords

emission
water vapour
leaves

Access to Document

https://edepot.wur.nl/290494

Cite this

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title = "Leaf diffusion resistance to water vapour and its direct measurement: Design, calibration and pertinent theory of an improved leaf diffusion resistance meter",

keywords = "emissie, waterdamp, bladeren, emission, water vapour, leaves",

author = "C.J. Stigter and J. Birnie and B. Lammers",

year = "1973",

language = "English",

series = "Mededelingen / Landbouwhogeschool Wageningen",

publisher = "Veenman",

number = "73-15",

address = "Netherlands",

}

TY - BOOK

T1 - Leaf diffusion resistance to water vapour and its direct measurement: Design, calibration and pertinent theory of an improved leaf diffusion resistance meter

AU - Stigter, C.J.

AU - Birnie, J.

AU - Lammers, B.

PY - 1973

Y1 - 1973

KW - emissie

KW - waterdamp

KW - bladeren

KW - emission

KW - water vapour

KW - leaves

M3 - Report

T3 - Mededelingen / Landbouwhogeschool Wageningen

BT - Leaf diffusion resistance to water vapour and its direct measurement: Design, calibration and pertinent theory of an improved leaf diffusion resistance meter

PB - Veenman

CY - Wageningen

ER -