Highly wear-resistant ultra-thin per-fluorinated organic monolayers on silicon(III) surfaces

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Abstract

This study reports on fluorine-containing alkyne-derived monolayers onto Si(1 1 1) substrates to obtain densely packed, highly wear-resistant surfaces. The nano-wear properties were measured using atomic force microscopy (AFM). The presence of the fluorinated monolayers was found to enhance the wear properties of the silicon surfaces, with a decrease of the depth of wear scratches of up to 120 times as compared to the unmodified surface. Ultimately, the scratch depth was only 6 nm for a heptadecafluoro-alkyl based monolayer for scratching normal forces as high as 38 µN.
Original languageEnglish
Pages (from-to)159-164
JournalApplied Surface Science
Volume287
DOIs
Publication statusPublished - 2013

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Keywords

  • self-assembled monolayers
  • atomic-force microscopy
  • nanotribological characterization
  • mono layers
  • friction
  • films
  • phosphonate
  • mechanisms
  • 1-alkynes
  • stability

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