Covalently attached organic monolayers on SiC and SixN4 surfaces: Formation using UV light at room temperature

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Abstract

We describe the formation of alkyl monolayers on silicon carbide (SiC) and silicon-rich silicon nitride (SixN4) surfaces, using UV irradiation in the presence of alkenes. Both the surface preparation and the monolayer attachment were carried out under ambient conditions. The stable coatings obtained in this way were studied by water contact angle measurements, infrared reflection absorption spectroscopy, X-ray reflectivity, and X-ray photoelectron spectroscopy. Besides unfunctionalized 1-alkenes, methyl undec-10-enoate, and 2,2,2-trifluoroethyl undec-10-enoate were also grafted onto both substrates. The resulting ester-terminated surfaces could then be further reacted after hydrolysis using amide chemistry to easily allow the attachment of amine-containing compounds.
Original languageEnglish
Pages (from-to)2172-2180
JournalLangmuir
Volume25
Issue number4
DOIs
Publication statusPublished - 2009

Fingerprint

Silicon carbide
silicon carbides
Ultraviolet radiation
Monolayers
Alkenes
alkenes
Olefins
attachment
room temperature
X ray absorption spectroscopy
infrared reflection
Silicon
Angle measurement
Silicon nitride
Amides
silicon nitrides
Temperature
amides
Contact angle
Amines

Keywords

  • self-assembled monolayers
  • silicon-nitride surfaces
  • hydrogen-terminated silicon
  • chemical-vapor-deposition
  • extremely mild attachment
  • diamond surfaces
  • alkyl monolayers
  • visible-light
  • photochemical functionalization
  • photoelectron-spectroscopy

Cite this

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title = "Covalently attached organic monolayers on SiC and SixN4 surfaces: Formation using UV light at room temperature",
abstract = "We describe the formation of alkyl monolayers on silicon carbide (SiC) and silicon-rich silicon nitride (SixN4) surfaces, using UV irradiation in the presence of alkenes. Both the surface preparation and the monolayer attachment were carried out under ambient conditions. The stable coatings obtained in this way were studied by water contact angle measurements, infrared reflection absorption spectroscopy, X-ray reflectivity, and X-ray photoelectron spectroscopy. Besides unfunctionalized 1-alkenes, methyl undec-10-enoate, and 2,2,2-trifluoroethyl undec-10-enoate were also grafted onto both substrates. The resulting ester-terminated surfaces could then be further reacted after hydrolysis using amide chemistry to easily allow the attachment of amine-containing compounds.",
keywords = "self-assembled monolayers, silicon-nitride surfaces, hydrogen-terminated silicon, chemical-vapor-deposition, extremely mild attachment, diamond surfaces, alkyl monolayers, visible-light, photochemical functionalization, photoelectron-spectroscopy",
author = "M. Rosso and M. Giesbers and A. Arafat and C.G.P.H. Schro{\"e}n and H. Zuilhof",
year = "2009",
doi = "10.1021/la803094y",
language = "English",
volume = "25",
pages = "2172--2180",
journal = "Langmuir",
issn = "0743-7463",
publisher = "American Chemical Society",
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Covalently attached organic monolayers on SiC and SixN4 surfaces: Formation using UV light at room temperature. / Rosso, M.; Giesbers, M.; Arafat, A.; Schroën, C.G.P.H.; Zuilhof, H.

In: Langmuir, Vol. 25, No. 4, 2009, p. 2172-2180.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Covalently attached organic monolayers on SiC and SixN4 surfaces: Formation using UV light at room temperature

AU - Rosso, M.

AU - Giesbers, M.

AU - Arafat, A.

AU - Schroën, C.G.P.H.

AU - Zuilhof, H.

PY - 2009

Y1 - 2009

N2 - We describe the formation of alkyl monolayers on silicon carbide (SiC) and silicon-rich silicon nitride (SixN4) surfaces, using UV irradiation in the presence of alkenes. Both the surface preparation and the monolayer attachment were carried out under ambient conditions. The stable coatings obtained in this way were studied by water contact angle measurements, infrared reflection absorption spectroscopy, X-ray reflectivity, and X-ray photoelectron spectroscopy. Besides unfunctionalized 1-alkenes, methyl undec-10-enoate, and 2,2,2-trifluoroethyl undec-10-enoate were also grafted onto both substrates. The resulting ester-terminated surfaces could then be further reacted after hydrolysis using amide chemistry to easily allow the attachment of amine-containing compounds.

AB - We describe the formation of alkyl monolayers on silicon carbide (SiC) and silicon-rich silicon nitride (SixN4) surfaces, using UV irradiation in the presence of alkenes. Both the surface preparation and the monolayer attachment were carried out under ambient conditions. The stable coatings obtained in this way were studied by water contact angle measurements, infrared reflection absorption spectroscopy, X-ray reflectivity, and X-ray photoelectron spectroscopy. Besides unfunctionalized 1-alkenes, methyl undec-10-enoate, and 2,2,2-trifluoroethyl undec-10-enoate were also grafted onto both substrates. The resulting ester-terminated surfaces could then be further reacted after hydrolysis using amide chemistry to easily allow the attachment of amine-containing compounds.

KW - self-assembled monolayers

KW - silicon-nitride surfaces

KW - hydrogen-terminated silicon

KW - chemical-vapor-deposition

KW - extremely mild attachment

KW - diamond surfaces

KW - alkyl monolayers

KW - visible-light

KW - photochemical functionalization

KW - photoelectron-spectroscopy

U2 - 10.1021/la803094y

DO - 10.1021/la803094y

M3 - Article

VL - 25

SP - 2172

EP - 2180

JO - Langmuir

JF - Langmuir

SN - 0743-7463

IS - 4

ER -