Covalently attached organic monolayers on SiC and SixN4 surfaces: Formation using UV light at room temperature

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Abstract

We describe the formation of alkyl monolayers on silicon carbide (SiC) and silicon-rich silicon nitride (SixN4) surfaces, using UV irradiation in the presence of alkenes. Both the surface preparation and the monolayer attachment were carried out under ambient conditions. The stable coatings obtained in this way were studied by water contact angle measurements, infrared reflection absorption spectroscopy, X-ray reflectivity, and X-ray photoelectron spectroscopy. Besides unfunctionalized 1-alkenes, methyl undec-10-enoate, and 2,2,2-trifluoroethyl undec-10-enoate were also grafted onto both substrates. The resulting ester-terminated surfaces could then be further reacted after hydrolysis using amide chemistry to easily allow the attachment of amine-containing compounds.
Original languageEnglish
Pages (from-to)2172-2180
JournalLangmuir
Volume25
Issue number4
DOIs
Publication statusPublished - 2009

Keywords

  • self-assembled monolayers
  • silicon-nitride surfaces
  • hydrogen-terminated silicon
  • chemical-vapor-deposition
  • extremely mild attachment
  • diamond surfaces
  • alkyl monolayers
  • visible-light
  • photochemical functionalization
  • photoelectron-spectroscopy

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