Chemical immobilisation of humic acid on silica.

L.K. Koopal, Y. Yang, A.J. Minnaard, P.L.M. Theunissen, W.H. van Riemsdijk

Research output: Contribution to journal › Article › Academic › peer-review

71 Citations (Scopus)

Original language	English
Pages (from-to)	385-395
Journal	Colloids and Surfaces. A: Physicochemical and Engineering Aspects
Volume	141
DOIs	https://doi.org/10.1016/S0927-7757(97)00170-2
Publication status	Published - 1998

Keywords

@article{f7a0e2a4c0a24f0ebc8cf3bb8b380ed1,

title = "Chemical immobilisation of humic acid on silica.",

keywords = "Aminopropyl silica, Humic acid, Immobilisation of humic acid, Iso-electric point, Proton charge density",

author = "L.K. Koopal and Y. Yang and A.J. Minnaard and P.L.M. Theunissen and {van Riemsdijk}, W.H.",

year = "1998",

doi = "10.1016/S0927-7757(97)00170-2",

language = "English",

volume = "141",

pages = "385--395",

journal = "Colloids and Surfaces. A: Physicochemical and Engineering Aspects",

issn = "0927-7757",

publisher = "Elsevier",

}

TY - JOUR

T1 - Chemical immobilisation of humic acid on silica.

AU - Koopal, L.K.

AU - Yang, Y.

AU - Minnaard, A.J.

AU - Theunissen, P.L.M.

AU - van Riemsdijk, W.H.

PY - 1998

Y1 - 1998

KW - Aminopropyl silica

KW - Humic acid

KW - Immobilisation of humic acid

KW - Iso-electric point

KW - Proton charge density

U2 - 10.1016/S0927-7757(97)00170-2

DO - 10.1016/S0927-7757(97)00170-2

M3 - Article

VL - 141

SP - 385

EP - 395

JO - Colloids and Surfaces. A: Physicochemical and Engineering Aspects

JF - Colloids and Surfaces. A: Physicochemical and Engineering Aspects

SN - 0927-7757

ER -